Fig. 2From: Facile fabrication of silver-nanowire-based chips using dry-film photoresist for wearable optical detectionSEM images of the AgNW spot after the development process (a), and etching and stripping (b). Enlarged SEM image corresponding to the interface between the AgNWs and the PET substrate (c) (magenta square from (b)). Insets are OM images taken at the corresponding steps of a and bBack to article page